A new methodology to assess the impact of fabrication inherent process variability on 14-nm fin field effect transistor (FinFET) device performance. August 18th, 2021 - By: Coventor A new methodology ...
Run a weekly test print showing solid color bars across the web. Include 100, 75 and 30% individual process color bars of at least 3” depth across the entire web width. Testing will show how well your ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results