In EUV lithography, and especially high-numerical-aperture EUV, balancing tradeoffs between resolution, sensitivity and line-width roughness is becoming increasingly difficult. Lithography patterning ...
Optical metasurfaces to perform optical analog spatial differentiation operations and image edge detection processing is a currently hot topic. However, some metasurface differentiators are limited by ...
Seoul, September 3, 2025 – SK hynix Inc. announced it has assembled what the company said is the industry’s first high numerical aperture extreme ultraviolet lithography (NA EUV) lithography system ...
AMSTERDAM, May 27 (Reuters) - Taiwan Semiconductor Manufacturing Co (2330.TW), the world's largest contract chipmaker, is still assessing when it will use ASML's cutting-edge high numerical aperture ...
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